Thin Film Industries rely on vacuum processes that deposit and/or remove thin layers of material ranging from fractions of a nanometer to several micrometers in thickness.
At MKS we've been helping customers for decades to solve the toughest technology challenges in thin film applications.
For example, we are the recognized leader in high accuracy pressure and vacuum instruments with our Baratron® capacitance manometer and Granville-Phillips® gauges. We revolutionized gas flow delivery with the first flow ratio controller that significantly increased the precision of the delivered gas across the entire substrate. We transformed chemical vapor deposition by inventing the ASTRON® remote plasma source for CVD chamber cleaning, eliminating the need for manual cleaning. Our LIQUOZON® technology enables the LTPS process to produce the most advanced OLED products on the market today. We developed gas analyzers that accurately identify the end point of a process and contaminants that would impair film quality.